Date:2026-01-19 Categories:Product knowledge Hits:252 From:Guangdong Youfeng Microelectronics Co., Ltd
Inductively Coupled Plasma (ICP) is an AD775ARZ-5 technology that utilizes the principle of electromagnetic induction to generate plasma. Plasma is a collection of charged particles composed of electrons, positive ions, and neutral atoms (or molecules), and is considered the fourth state of matter. In inductively coupled plasma, a changing magnetic field is generated by a coil through which an alternating current flows (usually located outside the quartz tube), which then excites plasma in the gas inside the quartz tube (usually an inert gas such as argon). This process does not require the electrode to come into contact with gas, thus avoiding electrode contamination and wear issues, making ICP technology characterized by high temperature, high ionization rate, and long lifespan.diode
The principle of inductively coupled plasma
The principle of inductively coupled plasma is based on Faraday's law of electromagnetic induction. By setting up a conductive coil around the plasma reaction chamber and introducing radio frequency (RF) current, an alternating magnetic field is generated inside the coil due to electromagnetic induction. When this alternating magnetic field passes through a gas (usually an inert gas such as argon), it causes electrons in the gas to gain energy and accelerate, resulting in collisions with gas atoms, ionization, and the formation of plasma.diode
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