Standard for the Measurement of Inductively Coupled Plasma 1

Inductively coupled plasma is a commonly used plasma excitation source that generates high-energy plasma through electromagnetic induction. This plasma is produced in induction coils or inductively coupled devices formed by high-frequency electromagnetic fields, typically excited by radio frequency power to ionize gases in a high-energy electric field and form a plasma state.diode

Inductively coupled plasma is widely used as a spectroscopic source in the field of chemical analysis. Its principle involves inducing plasma in gases through an alternating electromagnetic field, and conducting chemical analysis via the radiation emitted by the plasma. Two common application methods are Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES) and Inductively Coupled Plasma Mass Spectrometry (ICP-MS).

The characteristics of inductively coupled plasma include high temperature, low pressure, uniformity, and stability, making it widely applicable in fields such as surface treatment, material modification, and chemical reactions. Its excitation temperature can reach several thousand degrees Celsius, enabling surface treatment and modification of various materials.diode

The standard for determining inductively coupled plasma typically includes the following:

1. Instrument Calibration: Ensure the accuracy and stability of instruments by performing regular standard curve calibrations and CSD17306Q5A instrument performance verification.diode