A Detailed Explanation of MEMS High-Temperature Pressure Sensors 2

III. Preparation Process

The fabrication process of MEMS high-temperature pressure sensors includes steps such as photolithography, thin-film deposition, ion etching, and electrode deposition. First, microstructures and thin films are created on the silicon substrate using photolithography technology. Then, a sensitive layer is formed on the microstructures through thin-film deposition, which can respond to external pressure. Next, the microstructures undergo fine processing using ion etching technology. Finally, electrical connections for the sensor are provided through electrode deposition technology.diode

IV. Advantages

MEMS high-temperature pressure sensors offer the following advantages:

1. High Precision: Utilizing micro-nano fabrication techniques, the sensor achieves exceptional accuracy and stability.

2. High Reliability: Utilizing silicon materials and microstructure design, the sensor boasts excellent mechanical strength and anti-interference capabilities, enabling it to withstand harsh working environments.diode

3. Wide operating temperature range: The sensor can function normally at higher temperatures, making it suitable for high-temperature environments.diode

4. Compact size: The miniaturized design of the sensor makes it small in volume, facilitating easy integration into other devices.diode